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New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool
Title New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool Author Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV SCOPUS RID Co-authors Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Barák Vladislav 1948- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Hudek Peter 1953- SCOPUS RID ORCID Co-authors Partel Stefan Source document / Haščík Štefan 1956 ; Osvald Jozef 1953 ASDAM 2008 : conference proceedings. P. 199-202. - Piscataway, NJ : Institute of Electrical and Electronics Engineers, 2008 ; International Conference on Advanced Semiconductor Devices and Microsystems Language eng - English Country US - United States of America Document kind rozpis článkov z periodík (rzb) Category AEC - Scientific papers in foreign peer-reviewed proceedings, monographs Category of document (from 2022) V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka Type of document príspevok Year 2008 Registered in WOS Registered in SCOPUS DOI 10.1109/ASDAM.2008.4743316 
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rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2008
Number of the records: 1