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Chemically amplified deep UV resist for micromachining using electron beam lithography and dry etching
Title Chemically amplified deep UV resist for micromachining using electron beam lithography and dry etching Author Hudek Peter 1953- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Rangelow I.W. Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Stangl Guenther Grabiec P.B. Belov Miroslav Shi F. Co-authors Rangelow E.W. Source document Sensors and Materials. Vol. 10, no. 4 (1998) p. 219-227 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations SON, Sang Uk - CHOI, Yo Han - LEE, Seung S. An efficient cell count method using a lattice molded on indents of a culture dish. In SENSORS AND ACTUATORS A-PHYSICAL. ISSN 0924-4247, 2008, vol. 147, no. 2, pp. 665-671. Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 1998 Registered in WOS Registered in SCOPUS article
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 1998
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