Electron beam energy deposition and resist profile modeling during electron beam lithography process

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Title	Electron beam energy deposition and resist profile modeling during electron beam lithography process
Author	Cvetkov Kristian Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Koleva Elena
	Vutova Katia

Co-authors	Gerasimov Vladislav Asparuhova Boriana
Source document	International scientific conference High technologies. business. Society : Proceedings, Volume I "High technologies". Vol. II, no. 1 (2018), p. 124-127. - Sofia, Bulgaria : Scientific Technical Union of Mechanical Engineering Industry 4.0
Language	eng - English
Country	BG - Bulgaria
Document kind	rozpis článkov z periodík (rzb)
Category	AFC - Published papers from foreign scientific conferences
Year	2018

article

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2018

Number of the records: 1