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PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters
Title PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Vutova Katia Koleva Elena Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Source document Journal of Physics: Conference Series. Vol. 1492 (2020), art. no. 012015 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations LIU, Qing - CHEN, Yiqin - FENG, Zhanyong - SHU, Zhiwen - DUAN, Huigao. Resist nanokirigami for multipurpose patterning. In NATIONAL SCIENCE REVIEW, 2022, vol. 9, no. 11, pp. ISSN 2095-5138. Dostupné na: https://doi.org/10.1093/nsr/nwab231. ZHENG YU - GAO PIAO-PIAO - TANG XIN - LIU JIAN-ZHE - DUAN JI-AN. Effects of electron beam lithography process parameters on structure of silicon optical waveguide based on SOI. In JOURNAL OF CENTRAL SOUTH UNIVERSITY, 2022, vol. 29, no. 10, pp. 3335-3345. ISSN 2095-2899. Dostupné na: https://doi.org/10.1007/s11771-022-5152-0. XIANG, Shi Li - DING, Qi Chao - LIU, Jun - HU, Hao - ZHAO, Bo - LU, Shuang Zan - HUANG, Fan - CUNHA, Joao - RODRIGUES, José - YU, Zhipeng - YIN, Hong. Photoresist systems in floating T-gate fabrication for GaN high electron mobility transistors. In Nano Materials Science, 2024-01-01, pp. ISSN 20966482. Dostupné na: https://doi.org/10.1016/j.nanoms.2024.09.006. Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2020 Registered in WOS Registered in SCOPUS DOI 10.1088/1742-6596/1492/1/012015 
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File name Access Size Downloaded Type License PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters.pdf available 748.1 KB 1 Publisher's version rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2020 2019 0.227 Q3
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