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Experimental results of the stochastic coulomb interaction in ion projection lithography.
Title Experimental results of the stochastic coulomb interaction in ion projection lithography. Author Jager W.H. Co-authors Derksen G. Mertens B. Cekan E. Lammer G. Vonach H. Buschbeck H. Zeininger M. Horner C. Loeschner Hans Stengl G. Bleeker A. Benschop J. Shi F. Volland B. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Heerlein H. Rangelow I.W. Kaesmaier R. Source document Journal of Vacuum Science Technology B. Vol. 17, no. 6 (1999), p. 3099-3106 Language eng - English Country US - United States of America Document kind rozpis článkov z periodík (rbx) Citations GOLLADAY, SD - PFEIFFER, HC - ROCKROHR, JD - STICKEL, W. PREVAIL Alpha system: Status and design considerations. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, 2000, vol. 18, no. 6, pp. 3072-3078. JIANG, X. Resolution improvement and pattern generator development for the maskless micro-ion-beam reduction lithography system. PHD Thesis, University of California, Berkeley. 2006, 184 p. KRUIT, Pieter - JANSEN, Guus H. Space charge and statistical coulomb effects. In Handbook of Charged Particle Optics, Second Edition, 2017-12-19, pp. 341-389. XU, Yuan - WANG, Changyu - WANG, Yongtian - LIU, Juan. Review of Design Methods of Diffractive Optical Element. In Guangxue Xuebao/Acta Optica Sinica, 2023-04-01, 43, 8, pp. ISSN 02532239. Dostupné na: https://doi.org/10.3788/AOS230557. Category ADC Year 1999 Registered in WOS Registered in SCOPUS Registered in CCC article
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 1999 1998 1.662
Number of the records: 1