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Leakage characteristics of advanced MOS capacitors with hafnium silicate dielectric and Ru electrode

  1. TitleLeakage characteristics of advanced MOS capacitors with hafnium silicate dielectric and Ru electrode
    Author Ťapajna Milan 1977 SAVELEK - Elektrotechnický ústav SAV    ORCID
    Co-authors Hušeková Kristína 1957 SAVELEK - Elektrotechnický ústav SAV

    Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Dobročka Edmund 1955 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Roozeboom F.

    Source document ASDAM 2006. P. 21-24 : proceedings of the 6th International Conference on Advanced Semiconductor Devices and Microsystems. - Piscataway : IEEE, 2006 / Breza J. ; Donoval D. ; Vavrinský E.
    Languageeng - English
    CountrySK - Slovak Republic
    Document kindrozpis článkov z periodík (rzb)
    CategoryAEC - Scientific papers in foreign peer-reviewed proceedings, monographs
    Category of document (from 2022)V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka
    Type of documentpríspevok
    Year2006
    article

    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2006
Number of the records: 1  

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