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Modeling of the switching I-V characteristics in ultrathin (5nm) atomic layer deposited HfO2 films using the logistic hysteron

  1. TitleModeling of the switching I-V characteristics in ultrathin (5nm) atomic layer deposited HfO2 films using the logistic hysteron
    Author Blasco J.
    Co-authors Jančovič Peter 1990 SAVELEK - Elektrotechnický ústav SAV

    Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Suñé J.

    Miranda E.

    Source document Journal of Vacuum Science and Technology B. Vol. 33, (2015), 01A102, Microelectronics and Nanometer Structures
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
    CitationsKIM, M.H. - KIM, S. - RYOO, K.C. - CHO, S. - PARK, B.G. Circuit-level simulation of resistive-switching random-access memory cross-point array based on a highly reliable compact model. In JOURNAL OF COMPUTATIONAL ELECTRONICS. MAR 2018, vol. 17, no. 1, p. 273-278.
    LIN, Albert S. - PRATIK, Sparsh - OTA, Jun - RAWAT, Tejender Singh - HUANG, Tzu-Hsiang - HSU, Chun-Ling - SU, Wei-Ming - TSENG, Tseung-Yuen. A Process-Aware Memory Compact-Device Model Using Long-Short Term Memory. In IEEE ACCESS, 2021, vol. 9, no., pp. 3126-3139. ISSN 2169-3536. Dostupné na: https://doi.org/10.1109/ACCESS.2020.3047491.
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2015
    Registered inWOS
    Registered inCCC
    DOI 10.1116/1.4900599
    article

    article

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    A
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    201520141.464Q20.509Q2
Number of the records: 1  

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