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Study and comparison of resist characteristics for different negative tone electron beam resist
Title Study and comparison of resist characteristics for different negative tone electron beam resist Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Vutova Katia Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Koleva Elena Source document Journal of Physics: Conference Series. Vol. 2443, no. 1 (2023), art. no. 012006 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations WU, Yunhui - LIU, Lanlan - BO, Guohao - LI, Qiang - DAI, Chenjie - LI, Zhongyang - ZHANG, Jian - ZHANG, Xuefeng. Configurable swellability of hydrogel microstructure for structural-color-based imaging concealment/encryption. In Nanoscale, 2024-02-01, 16, 8, pp. 4289-4298. ISSN 20403364. Dostupné na: https://doi.org/10.1039/d3nr05606f. Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2023 Registered in SCOPUS DOI 10.1088/1742-6596/2443/1/012006 
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rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2023 2022 0.183
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