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Structuring of titanium nitride films by dry reactive ion etching
Title Structuring of titanium nitride films by dry reactive ion etching Author Izsák Tibor SAVELEK - Elektrotechnický ústav SAV ORCID Co-authors Ščepka Tomáš 1985 SAVELEK - Elektrotechnický ústav SAV Vanko Gabriel 1981 SAVELEK - Elektrotechnický ústav SAV ORCID Fedor Ján 1976 SAVELEK - Elektrotechnický ústav SAV Romanyuk O. Hudec Boris SAVELEK - Elektrotechnický ústav SAV ORCID Source document Proceedings of ADEPT 2023 : 11th International Conference on Advances in Electronic and Photonic Technologies, held in Podbanské, High Tatras, Slovakia, June 12th – 15th, 2023. P. 150-153. - Žilina : University of Zilina in EDIS-Publishing Centre of UZ, 2023 / Jandura D. ; Lettrichová I. ; Kováč J., jr. Language eng - English Country SK - Slovak Republic Document kind rozpis článkov z periodík (rzb) Category AFD - Published papers from domestic scientific conferences Category of document (from 2022) V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka Type of document príspevok z podujatia Year 2023 article
File name Access Size Downloaded Type License Structuring of titanium nitride films by dry reactive ion etching.pdf available 428.4 KB 0 Publisher's version rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2023
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