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Oblique angle sputtering of ZnO: Ga thin films
Title Oblique angle sputtering of ZnO: Ga thin films Author Tvarožek V. Co-authors Novotný I. Šutta P. Netrvalová M. Vávra Ivo 1949 SAVELEK - Elektrotechnický ústav SAV Bruncko J. Gašpierik P. Flickyngerová S. Source document Physics Procedia. Vol. 32, (2012), p. 456-463 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations YANG, Z.P. - XIE, Z.H. - LIN, C.C. - LEE, Y.J. In OPTICAL MATERIALS EXPRESS. FEB 1 2015, vol. 5, no. 2, p. 399-407. FERNANDEZ, S. - GRANDAL, J. - TRAMPERT, A. - NARANJO, F.B. In MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. JUN 2017, vol. 63, p. 115-121. ANH TUAN THANH PHAM - OANH KIEU TRUONG LE - DUNG VAN HOANG - TRUONG HUU NGUYEN - TRANG HUYEN CAO PHAM - PHUONG THANH NGOC VO - THANG BACH PHAN - VINH CAO TRAN. Controlling thickness to tune performance of high-mobility transparent conducting films deposited from Ga-doped ZnO ceramic target. In JOURNAL OF THE EUROPEAN CERAMIC SOCIETY. ISSN 0955-2219, 2021, vol. 41, no. 6, pp. 3493-3500. Dostupné na: https://doi.org/10.1016/j.jeurceramsoc.2021.01.029. Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2012 Registered in WOS Registered in SCOPUS DOI 10.1109/ASDAM.2012.6418515 article
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2012 2011 0.227
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