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Oxygen tolerant copper mediated photo-ATRP under specific polymerization conditions
Title Oxygen tolerant copper mediated photo-ATRP under specific polymerization conditions Author Mosnáček Jaroslav 1975- SAVPOLYM ; SAVCEMEA - Ústav polymérov SAV ORCID Co-authors Kollár Jozef 1977- SAVPOLYM - Ústav polymérov SAV Bondarev Dmitrij 1977- SAVPOLYM - Ústav polymérov SAV Hološ Ana 1985- SAVPOLYM - Ústav polymérov SAV Zain Gamal SAVPOLYM - Ústav polymérov SAV Eckstein Andicsová Anita 1979- SAVPOLYM - Ústav polymérov SAV ORCID Borská Katarína 1983- SAVPOLYM - Ústav polymérov SAV ORCID Moravčíková Daniela 1984- SAVPOLYM - Ústav polymérov SAV ORCID Co-authors Karim Rubina SAVCEMEA - Centrum pre využitie pokročilých materiálov SAV Source document VESPS 2021 : Virtual European Symposium of Photopolymer Science dedicated to Ewa Andrzejewska : book of abstracts. P. 63. - Gumpoldskirchen, Austria : ChemIT e.U. - Book-of-abstracts.com, 2021 / Krebs Heinz A. ; VESP 2021 Virtual European Symposium of Photopolymer Science dedicated to Ewa Andrzejewska Language eng - English URL vesps2021.net Document kind rozpis článkov z periodík (rzb) Category AFE - Abstracts of invited papers from foreign conferences Year 2021 
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rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2021
Number of the records: 1