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6HC-SiC Schottky diode edge terminated using amorphous SiC by sputterning method

  1. Title6HC-SiC Schottky diode edge terminated using amorphous SiC by sputterning method
    Author Matsumoto K.
    Co-authors Chen Y.

    Kuzmík Ján 1960 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Nishino S.

    Source document Materials Science Forum. Vol. 264-268 (1998), p. 925-928
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
    CitationsPORRO, S. - CIECHONSKI, R.R. - SYVAJARVI, M. - YAKIMOVA, R. Electrical analysis and interface states evaluation of Ni Schottky diodes on 4H-SiC thick epilayers. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. ISSN 0031-8965, OCT 2005, vol. 202, no. 13, p. 2508-2514.
    CIECHONSKI, R.R. - PORRO, S. - SYVAJARVI, M. - YAKIMOVA, R. Evaluation of on-state resistance and boron-related levels in n-type 4H-SiC. SILICON CARBIDE AND RELATED MATERIALS 2004. ISSN 0255-5476, 2005, vol. 483, p. 425-428.
    ZHANG, J.Y. - HARRELL, W.R. Analysis of the I-V characteristics of Al/4H-SiC Schottky diodes. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, MAR-APR 2003, vol. 21, no. 2, p. 872-878.
    HARRELL, W.R. - ZHANG, J.Y. - POOLE, K.F. Aluminum Schottky contacts to n-type 4H-SiC. JOURNAL OF ELECTRONIC MATERIALS. ISSN 0361-5235, OCT 2002, vol. 31, no. 10, p. 1090-1095.
    CategoryADE
    Year1998
    article

    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    1998
Number of the records: 1  

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