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HTS thin films by innovative MOCVD processe
Title HTS thin films by innovative MOCVD processe Author Weiss F. Co-authors Schmatz U. Pisch A. Felten F. Pignard S. Senateur J.P. Abrutis A. Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV ORCID Selbmann D. Klippe J. Source document Journal of Alloys and Compounds. Vol. 251 (1997), p. 264 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations HOU, X.H. - CHOY, K.L. CHEMICAL VAPOR DEPOSITION. ISSN 0948-1907, OCT 2006, vol. 12, no. 10, p. 583-596. TAVARES, P.B. - AMARAL, V.S. - ARAUJO, D. - OLIVEIRA, M.C. - VIEIRA, J.M. ADVANCED MATERIALS FORUM I. ISSN 1013-9826, 2002, vol. 230-2, p. 173-176. YAMAMOTO, S. - ODA, S. CHEMICAL VAPOR DEPOSITION. ISSN 0948-1907, JAN 2001, vol. 7, no. 1, p. 7-18. CHUPRAKOV, I.S. - MARTIN, J.D. - DAHMEN, K.H. JOURNAL DE PHYSIQUE IV. ISSN 1155-4339, SEP 1999, vol. 9, no. P8, Part 2, p. 901-908. YAMAMOTO, S. - SUGAI, S. - ODA, S. JOURNAL DE PHYSIQUE IV. ISSN 1155-4339, SEP 1999, vol. 9, no. P8, Part 2, p. 1013-1020. TAVARES, P.B. - AMARAL, V.S. - ARAUJO, J.P. - SOUSA, J.B. - LOURENCO, A.A.C.S. - VIEIRA, J.M. JOURNAL OF APPLIED PHYSICS. ISSN 0021-8979, APR 15 1999, vol. 85, no. 8, Part 2B, p. 5411-5413. Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 1997 article
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 1997 1996 0.829
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