Patterning of structures by e-beam lithography and ion etching for gas sensor applications

Number of the records: 1

Title	Patterning of structures by e-beam lithography and ion etching for gas sensor applications
Author	Ďurina P.
Co-authors	Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Vutova Katia
	Koleva Elena
	Mladenov Georgy
	Kuš P.
	Pleceník A.

Source document	Journal of Physics: Conference Series. Vol. 514 (2014), art. no. 012037
Language	eng - English
Note	18th International Summer School on Vacuum, Electron and Ion Technologies (VEIT 2013), Sozopol, Bulgaria, October 7-11, 2014
Document kind	rozpis článkov z periodík (rbx)
Citations	SAMA, Jordi - DOMENECH-GIL, Guillem - GRACIA, Isabel - BORRISE, Xavier - CANE, Carles - BARTH, Sven - STEIB, Frederik - WAAG, Andreas - DANIEL PRADES, Juan - ROMANO-RODRIGUEZ, Albert. Electron beam lithography for contacting single nanowires on non-flat suspended substrates. In SENSORS AND ACTUATORS B-CHEMICAL. ISSN 0925-4005, 2019, vol. 286, no., pp. 616-623.
Category	ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	2014
Registered in	WOS
Registered in	SCOPUS
DOI	10.1088/1742-6596/514/1/012037

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	N

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2014	2013			0.231

Number of the records: 1