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The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma
Title The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV SCOPUS RID Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV SCOPUS RID Škriniarová Jaroslava Source document Journal of Electrical Engineering. Vol. 64, no. 6 (2013), p. 371-375 Language eng - English Country SK - Slovak Republic Document kind rozpis článkov z periodík (rbx) Citations ZHUKOV, A.A. - ILYIN, E.Y. - GERASIMENKO, N.N. Influence of photolithographic process conditions on obtaining a negative tilt of thick positive photoresist mask. InIzvestija vysšich učebnych zavedenij, elektronika. ISSN 1561-5405, 2015, vol. 20, no. 4, pp. 440-442. VAIDULYCH, Mykhailo - HANUS, Jan - STEINHARTOVA, Tereza - KYLIAN, Ondrej - CHOUKOUROV, Andrei - BERANOVA, Jana - KHALAKHAN, Ivan - BIEDERMAN, Hynek. Deposition of Ag/a-C:H nanocomposite films with Ag surface enrichment. In PLASMA PROCESSES AND POLYMERS. ISSN 1612-8850, 2017, vol. 14, no. 11, pp. TOBING, Landobasa Y. M. - MUELLER, Aaron D. - TONG, Jinchao - ZHANG, Dao Hua. Nanobridges formed through electron beam image reversal lithography for plasmonic mid-infrared resonators with high aspect ratio nanogaps. In NANOTECHNOLOGY. ISSN 0957-4484, 2019, vol. 30, no. 42, pp. Category ADNA - Scientific papers in domestic impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2013 Registered in WOS Registered in SCOPUS DOI 10.2478/jee-2013-0056 
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rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2013 2012 0.546 Q4 0.160
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