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HTS thin films by innovative MOCVD processe

  1. TitleHTS thin films by innovative MOCVD processe
    Author Weiss F.
    Co-authors Schmatz U.

    Pisch A.

    Felten F.

    Pignard S.

    Senateur J.P.

    Abrutis A.

    Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Selbmann D.

    Klippe J.

    Source document Journal of Alloys and Compounds. Vol. 251 (1997), p. 264
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
    CitationsHOU, X.H. - CHOY, K.L. CHEMICAL VAPOR DEPOSITION. ISSN 0948-1907, OCT 2006, vol. 12, no. 10, p. 583-596.
    TAVARES, P.B. - AMARAL, V.S. - ARAUJO, D. - OLIVEIRA, M.C. - VIEIRA, J.M. ADVANCED MATERIALS FORUM I. ISSN 1013-9826, 2002, vol. 230-2, p. 173-176.
    YAMAMOTO, S. - ODA, S. CHEMICAL VAPOR DEPOSITION. ISSN 0948-1907, JAN 2001, vol. 7, no. 1, p. 7-18.
    CHUPRAKOV, I.S. - MARTIN, J.D. - DAHMEN, K.H. JOURNAL DE PHYSIQUE IV. ISSN 1155-4339, SEP 1999, vol. 9, no. P8, Part 2, p. 901-908.
    YAMAMOTO, S. - SUGAI, S. - ODA, S. JOURNAL DE PHYSIQUE IV. ISSN 1155-4339, SEP 1999, vol. 9, no. P8, Part 2, p. 1013-1020.
    TAVARES, P.B. - AMARAL, V.S. - ARAUJO, J.P. - SOUSA, J.B. - LOURENCO, A.A.C.S. - VIEIRA, J.M. JOURNAL OF APPLIED PHYSICS. ISSN 0021-8979, APR 15 1999, vol. 85, no. 8, Part 2B, p. 5411-5413.
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year1997
    article

    article

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    A
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    199719960.829
Number of the records: 1  

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