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Influence of backscattered electrons on the quality of structures in the thin resist layer patterned using e-beam with the Gaussian distribution of electron energies
Title Influence of backscattered electrons on the quality of structures in the thin resist layer patterned using e-beam with the Gaussian distribution of electron energies Author Ďurina P. Co-authors Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Kúš P. Pleceník A. Source document / Vajda J. ; Jamnický I. APCOM 2012 : proceedings on Applied Physics of Condensed Matter of the 18th International Conference. P. 161-164. - Bratislava : Slovenská technická univerzita v Bratislave, 2012 ; International Conference on Applied Physics of Condensed Matter APCOM 2012 Language eng - English Country SK - Slovak Republic Document kind rozpis článkov z periodík (rzb) Category AFDA - Published papers from international scientific conferences in Slovakia Year 2012 article
rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2012
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