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Effect of mask material on the side walls angle of boron doped diamond patterns etched in various types of plasma

  1. TitleEffect of mask material on the side walls angle of boron doped diamond patterns etched in various types of plasma
    Author Marton Marián
    Co-authors Ritomský Mário 1993-    SCOPUS    RID    ORCID

    Řeháček V.

    Michniak P.

    Behúl Miroslav

    Redhammer R.

    Vojs M.

    Source document MME 2018 : 29th Micromechanics and Microsystems Europe Workshop : Booklet with full papers. P. 150-155. - Bratislava : Slovak University of Technology, Bratislava, 2018 / Hotový I. ; Mikolášek M. ; Predanocy Martin 1984- ; MME 2018 29th Micromechanics and Microsystems Europe Workshop
    Languageeng - English
    CountrySK - Slovak Republic
    Document kindrozpis článkov z periodík (rzb)
    CategoryAFD - Published papers from domestic scientific conferences
    Year2018
    article

    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2018
Number of the records: 1  

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