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Minimum ion bean exposure dose determination for chemically amplified resist from printed dot matrices
Title Minimum ion bean exposure dose determination for chemically amplified resist from printed dot matrices Author Bruenger W.H. Co-authors Torkler M. Weiss M. Loeschner Hans Leung K. Lee Y. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Rangelow I.W. Stangl Guenther Fallmann W. Source document Journal of Vacuum Science and Technology B. Vol. 17, no. 6 (1999), p. 3119-3121 Language eng - English Country US - United States of America Document kind rozpis článkov z periodík (rbx) Citations DEVOLDER, T - CHAPPERT, C - BERNAS, H. Theoretical study of magnetic pattern replication by He+ ion irradiation through stencil masks. In JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS. ISSN 0304-8853, 2002, vol. 249, no. 3, pp. 452-457. FASSBENDER, J - RAVELOSONA, D - SAMSON, Y. Tailoring magnetism by light-ion irradiation. In JOURNAL OF PHYSICS D-APPLIED PHYSICS. ISSN 0022-3727, 2004, vol. 37, no. 16, pp. R179-R196. Category ADC Year 1999 article
rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 1999 1998 1.662
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