Aqueous base developable epoxy resist for high sensitivity electron beam lithography

Number of the records: 1

Title	Aqueous base developable epoxy resist for high sensitivity electron beam lithography
Author	Argitis P.
Co-authors	Glezos N.
	Vasilopoulou M.
	Raptis I.
	Hatzakis M.
	Everett J.
	Meneghini G.
	Palumbo A.
	Ardito M.
	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID

Source document	Microelectronic Engineering. Vol. 53, No. 1-4 (2000), p. 453-456
Language	eng - English
Country	NL - Netherlands
Document kind	rozpis článkov z periodík (rbx)
Citations	PEPIN, A - STUDER, V - DECANINI, D - CHEN, Y. Exploring the high sensitivity of SU-8 resist for high resolution electron beam patterning. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2004, vol. 73-4, no., pp. 233-237.
	HIRSCHER, S - KAESMAIER, R - DOMKE, WD - WOLTER, A - LOSCHNER, H - CEKAN, E - HORNER, C - ZEININGER, M - OCHSENHIRT, J. Resist process development for sub-100-nm ion projection lithography. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2001, vol. 57-8, no., pp. 517-530.
Category	ADC
Year	2000
Registered in	WOS
Registered in	SCOPUS
Registered in	CCC
DOI	10.1016/S0167-9317(00)00354-3

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	A

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2000	1999	0.810

Number of the records: 1