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Investigation of e-beam resists for structure patterning in the nanophotonic device fabrication
Title Investigation of e-beam resists for structure patterning in the nanophotonic device fabrication Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Glezos N. Haščík Štefan 1956 SAVELEK - Elektrotechnický ústav SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV SCOPUS RID Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV SCOPUS RID Škriniarová Jaroslava Source document / Pudiš D. ; Šušlík Ľ. ; Kováč J., jr. ; Flickyngerová S. ; Lettrichová I. Proceedings of ADEPT : 2nd International Conference on Advances in Electronic and Photonic Technologies. P. 241-246. - Žilina : University of Žilina, 2014 ; International Conference on Advances in Electronic and Photonic Technologies ADEPT 2014 Language eng - English Country SK - Slovak Republic Document kind rozpis článkov z periodík (rzb) Category AFD - Published papers from domestic scientific conferences Year 2014 
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rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2014
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