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Structuring of titanium nitride films by dry reactive ion etching

  1. TitleStructuring of titanium nitride films by dry reactive ion etching
    Author Izsák Tibor SAVELEK - Elektrotechnický ústav SAV    ORCID
    Co-authors Ščepka Tomáš 1985 SAVELEK - Elektrotechnický ústav SAV

    Vanko Gabriel 1981 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Fedor Ján 1976 SAVELEK - Elektrotechnický ústav SAV

    Romanyuk O.

    Hudec Boris SAVELEK - Elektrotechnický ústav SAV    ORCID

    Source document Proceedings of ADEPT 2023 : 11th International Conference on Advances in Electronic and Photonic Technologies, held in Podbanské, High Tatras, Slovakia, June 12th – 15th, 2023. P. 150-153. - Žilina : University of Zilina in EDIS-Publishing Centre of UZ, 2023 / Jandura D. ; Lettrichová I. ; Kováč J., jr.
    Languageeng - English
    CountrySK - Slovak Republic
    Document kindrozpis článkov z periodík (rzb)
    CategoryAFD - Published papers from domestic scientific conferences
    Category of document (from 2022)V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka
    Type of documentpríspevok z podujatia
    Year2023
    article

    article

    File nameAccessSizeDownloadedTypeLicense
    Structuring of titanium nitride films by dry reactive ion etching.pdfavailable428.4 KB0Publisher's version
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2023
Number of the records: 1  

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