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Records found: 6  
Your query: Author Sysno = "^sav_un_auth 0043765^"
  1. TitleWork function thermal stability of RuO2-rich Ru-Si-O p-channel metal-oxide-semiconductor field-effect transistor gate electrodes
    Author Ťapajna Milan 1977 SAVELEK - Elektrotechnický ústav SAV
    Co-authors Rosová Alica 1962 SAVELEK - Elektrotechnický ústav SAV
    Dobročka Edmund 1955 SAVELEK - Elektrotechnický ústav SAV
    Štrbík Vladimír 1954 SAVELEK - Elektrotechnický ústav SAV
    Gaži Štefan 1948 SAVELEK - Elektrotechnický ústav SAV
    Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV
    Benko P.
    Harmatha L.
    Manke C.
    Baumann P.K.
    Source document . Vol. 103, (2008), art. no. 073702 Journal of Applied Physics
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2008
    article

    article

  2. TitleFixed oxide charge in Ru-based chemical vapour deposited high-? gate stacks
    Author Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV
    Co-authors Lupták Roman SAVELEK - Elektrotechnický ústav SAV
    Ťapajna Milan 1977 SAVELEK - Elektrotechnický ústav SAV
    Hušeková Kristína 1957 SAVELEK - Elektrotechnický ústav SAV
    Weber U.
    Baumann P.K.
    Lindner J.
    Source document / Gusev E.P. Defects in high-K gate dielectric stacks. P. 277-286 : nano-electronic semiconductor devices : proceedings of the NATO Advanced Research Workshop on defects in Advanced High-K Dielectric Nano-electronicc Semiconductor Devices, St. Petetburg, Russia, July 11-14, 2005. - Dordrecht : Springer, 2006
    CategoryAEC - Scientific papers in foreign peer-reviewed proceedings, monographs
    Category of document (from 2022)V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka
    Type of documentpríspevok
    Year2006
    article

    article

  3. Title2D and 3D growth of Ru/RuO2 metal layers with atomic vapour deposition
    Author Manke C.
    Co-authors Boissiere O.
    Weber U.
    Barbar G.
    Baumann P.K.
    Lindner J.
    Ťapajna Milan 1977 SAVELEK - Elektrotechnický ústav SAV
    Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV
    Source document Microelectronic Engineering. Vol. 83, (2006), p. 2277. - Amsterdam : Elsevier Science Publishers
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2006
    article

    article

  4. TitleProperties of Ru/HfxSi1-xOy/Si metal oxide semiconductor gate stack structures grown by atomic vapor deposition
    Author Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV
    Co-authors Lupták Roman SAVELEK - Elektrotechnický ústav SAV
    Hušeková Kristína 1957 SAVELEK - Elektrotechnický ústav SAV
    Čičo Karol SAVELEK - Elektrotechnický ústav SAV
    Ťapajna Milan 1977 SAVELEK - Elektrotechnický ústav SAV
    Weber U.
    Baumann P.K.
    Lindner J.
    Espinos J.P.
    Source document Journal of the Electrochemical Society. Vol. 153, (2006), p. F176-F179. - Penington
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2006
    article

    article

  5. TitleLow-temperature growth of RuO2 films for conductive electrode applications
    Author Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV
    Co-authors Cambel Vladimír 1956 SAVELEK - Elektrotechnický ústav SAV
    Machajdík Daniel SAVELEK - Elektrotechnický ústav SAV
    Baumann P.K.
    Lindner J.
    Schumacher M.
    Juergensen H.
    Source document . Vol. . 5 (2003), p. 173-177 Materials science in semiconductor processing
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2003
    article

    article

  6. TitlePlatinum, ruthenium and ruthenium dioxide electrodes deposited by metal organic chemical vapour deposition for oxide applications
    Author Baumann P.K.
    Co-authors Doppelt P.
    Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV
    Gueroudji L.
    Cambel Vladimír 1956 SAVELEK - Elektrotechnický ústav SAV
    Machajdík Daniel SAVELEK - Elektrotechnický ústav SAV
    Schumacher M.
    Lindner J.
    Schienle F.
    Burgess D.
    Strauch G.
    Juergensen H.
    Guillon H.
    Jimenez C.
    Source document Integrated Ferroelectrics. Vol. 44 (2002), p. 135-139
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2002
    article

    article



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