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Title 35uM thick high-resolution silicon stencil mask: Fabrication and operation in high energy ion projection and 10xdemagnification ion projection lithography Author Rangelow I.W. Co-authors Sossna E. Volland B. Shi F. Meijer J. Stephan A. Weidenmuller U. Bukow H.H. Rolfs C. Ngo Vinh Van Leung K.N. Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV Action The 45th International Conference on Electron, Ion and Photo Beam Technology and Nanofabrication. EIPBN 2001 ( 45th : May 29-June 1, 2001 : Washington, DC ) Source document The 45th International Conference on Electron, Ion and Photo Beam Technology and Nanofabrication : EIPBN 2001. Abstracts. P. 96-97. - Washington, DC, USA, 2001 Category AFG - Abstracts of papers from foreign conferences Year 2001 
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