Search results
Title Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment Author Volland B. Co-authors Shi F. Heerlein H. Rangelow I.W. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Cekan E. Vonach H. Loeschner Hans Horner C. Stengl G. Buschbeck H. Zeininger M. Bleeker A. Benschop J. Source document Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3202-3206 Category ADC Year 2000 DOI 10.1116/1.1319688 
article
Title Experimental results of the stochastic coulomb interaction in ion projection lithography. Author Jager W.H. Co-authors Derksen G. Mertens B. Cekan E. Lammer G. Vonach H. Buschbeck H. Zeininger M. Horner C. Loeschner Hans Stengl G. Bleeker A. Benschop J. Shi F. Volland B. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Heerlein H. Rangelow I.W. Kaesmaier R. Source document Journal of Vacuum Science Technology B. Vol. 17, no. 6 (1999), p. 3099-3106 Category ADC Year 1999 article
Title DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing Author Bruenerg W. H. Co-authors Buschbeck H. Cekan E. Eder S. Fedynyshyn T. H. Hertlein W. G. Hudek Peter 1953- Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Loeschner Hans Rangelow I.W. Torkler M. Source document Microelectronic Engineering : an International Journal of Semiconductor Manufacturing Technology. Vol. 42 (1998) p. 237-240 Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 1998 DOI 10.1016/S0167-9317(98)00054-9 article