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Title Optimization of electron beam lithography processing of resist AR-N 7520 Author Koleva Elena Co-authors Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Koleva Lilyana Vutova Katia Markova Irina Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Andok Robert 1973- SAVINFO - Ústav informatiky SAV Action VI International scientific conference INDUSTRY 4.0. Winter session : 8-11 December 2021 : Borovets, Bulgaria Source document Industry 4.0. Vol. 6, no. 5 (2021), p. 189-191 Category ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok z podujatia Year 2022 
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