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Title Study of lithographic parameters for the trilayer resist systems in electron beam lithography Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Ritomský Mário 1993- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Source document AIP Conference Proceedings. Vol. 2778 (2023), art. no. 030001 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2023 DOI 10.1063/5.0136258 
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Title Optimisation criteria for the process electron beam lithography of negative AR-N7520 resists Author Koleva Elena Co-authors Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Andok Robert 1973- SAVINFO - Ústav informatiky SAV Vutova Katia Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Source document Journal of Physics: Conference Series. Vol. 2443, no. 1 (2023), art. no. 012007 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2023 DOI 10.1088/1742-6596/2443/1/012007 article
Title Optimization of electron beam lithography processing of resist AR-N 7520 Author Koleva Elena Co-authors Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Koleva Lilyana Vutova Katia Markova Irina Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Andok Robert 1973- SAVINFO - Ústav informatiky SAV Action VI International scientific conference INDUSTRY 4.0. Winter session : 8-11 December 2021 : Borovets, Bulgaria Source document Industry 4.0. Vol. 6, no. 5 (2021), p. 189-191 Category ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok z podujatia Year 2022 article
Title Study on electron beam irradiation sensitive polymers Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV Action International Conference of Condensed Matter (APCOM 2017) : June 12-14, 2017 : Štrbské Pleso, Slovak Republic Source document APCOM 2017 : Proceedings of the 23th International Conference on Applied Physics of Condensed Matter, June 12-14, 2017, Štrbské Pleso, Slovak Republic. P. 194-198. - Bratislava : SPEKTRUM STU, 2017 / Vajda J. ; Jamnický I. Category AFD - Published papers from domestic scientific conferences Year 2017 article
Title Resist characteristics simulation of HSQ electron beam resist Author Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Koleva Elena Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV Mladenov Georgy Source document Electrotechnica & electronica E+E. Vol. 51, no. 5-6 (2016), p. 246-250 Category ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2016 article
Title Study on polymers with implementation in electron beam lithography Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Koleva Elena Andok Robert 1973- SAVINFO - Ústav informatiky SAV Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Mladenov Georgy Source document Polymer Science : Research advances, practical applications and educational aspects. No. 1, p. 488-497. - Spain : Formatex Research Center, 2016 Category BEE - Professional papers in foreign proceedings (conference/non-conference; peer-reviewed/non-peer-reviewed) Category of document (from 2022) O2 - Odborný výstup publikačnej činnosti ako časť knižnej publikácie alebo zborníka Type of document príspevok Year 2016 article
Title Patterning of structures by e-beam lithography and ion etching for gas sensor applications Author Ďurina P. Co-authors Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Vutova Katia Koleva Elena Mladenov Georgy Kuš P. Pleceník A. Source document Journal of Physics: Conference Series. Vol. 514 (2014), art. no. 012037 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2014 DOI 10.1088/1742-6596/514/1/012037 article
Title Study of electron beam resists: negative tone HSQ and positive tone SML300 Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV Koleva Elena Vutova Katia Mladenov Georgy Action International Conference on Electron Beam Technologies ( 11th : June 8-12, 2014 : Varna ) Source document Elektrotechnika i elektronika E+E : Eleventh International Conference on Electron Beam Technologies. Vol. 49 (2014) no. 5-6 Category ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2014 article
Title Investigation of e-beam resists for structure patterning in the nanophotonic device fabrication Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Andok Robert 1973- SAVINFO - Ústav informatiky SAV Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Glezos N. Haščík Štefan 1956 SAVELEK - Elektrotechnický ústav SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV Škriniarová Jaroslava Source document / Pudiš D. ; Šušlík Ľ. ; Kováč J., jr. ; Flickyngerová S. ; Lettrichová I. Proceedings of ADEPT : 2nd International Conference on Advances in Electronic and Photonic Technologies. P. 241-246. - Žilina : University of Žilina, 2014 ; International Conference on Advances in Electronic and Photonic Technologies ADEPT 2014 Category AFD - Published papers from domestic scientific conferences Year 2014 article
Title Limits to nanopatterning based on e-beam lithography Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Glezos N. Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV Nemec Pavol 1975- Písečný Pavol Velessiotis Dimitrios Source document Proceedings of the 20th International Conference on Applied Physics of Condensed Matter : APCOM 2014. P. 292-295. - Bratislava : FEI STU, 2014 / Vajda J. ; Jamnický I. ; International Conference on Applied Physics of Condensed Matter APCOM 2014 Category AFDA - Published papers from international scientific conferences in Slovakia Year 2014 article