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Title Minimum ion bean exposure dose determination for chemically amplified resist from printed dot matrices Author Bruenger W.H. Co-authors Torkler M. Weiss M. Loeschner Hans Leung K. Lee Y. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Rangelow I.W. Stangl Guenther Fallmann W. Source document Journal of Vacuum Science and Technology B. Vol. 17, no. 6 (1999), p. 3119-3121 Category ADC Year 1999 
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