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Title Aqueous base developable epoxy resist for high sensitivity electron beam lithography Author Argitis P. Co-authors Glezos N. Vasilopoulou M. Raptis I. Hatzakis M. Everett J. Meneghini G. Palumbo A. Ardito M. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Action MNE'99. Micro and Nano Engineering International Conference : September 21-23, 1999 : Roma, Italy Source document Microelectronic Engineering. Vol. 53, No. 1-4 (2000), p. 453-456 Category ADC Year 2000 DOI 10.1016/S0167-9317(00)00354-3 
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