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Title Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy Author Dreeskornfeld L. Co-authors Segler R. Haindl G. Wehmeyer O. Rahn S. Majková Eva 1950 SAVFYZIK - Fyzikálny ústav SAV Kleineberg U. Heinzmann U. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Source document Microelectronic Engineering. Vol. 54, no. 3-4 (2000), p. 303-314 Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2000 DOI 10.1016/S0167-9317(99)00449-9 
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