Search results
Title Directly sputtered stress-compensated carbon protective layer for silicon stencil masks Author Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Co-authors Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV Držík Milan SAVSTAV - Ústav stavebníctva a architektúry SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Torres J. Wasson J. Wolfe J.C. Degen A. Rangelow I.W. Voigt D. (Dieter) Butschke J. Letzkus F. Springer R. Ehrmann A. Kaesmaier R. Kragler K. Mathuni J. Loeschner Hans Source document Journal of Vacuum Science and Technology B. Vol. 17, no. 6 (1999), p. 3127-3131 Category ADC Year 1999 
article
Title Placement measurement and FE modeling results for distortion control of stencil masks Author Ehrmann A. Co-authors Kaesmaier R. Kragler K. Struck T. Haugender E. Loschner H. Lutz J. Butschke J. Letzkus F. Springer R. Držík Milan SAVSTAV - Ústav stavebníctva a architektúry SAV Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Degen A. Shi F. Volland B. Sossna E. Rangelow I.W. Engelstad R.L. Action 19th Annual BACUS Symposium on Photomask Technology and Management. Technical Conference Vol 3873 : September 1999 : Monterey CA, USA Source document 19th Annual BACUS Symposium on Photomask Technology and Management : Proceedings. - CA, USA, 1999 Category AFC - Published papers from foreign scientific conferences Year 1999 article