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Title Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment Author Volland B. Co-authors Shi F. Heerlein H. Rangelow I.W. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Cekan E. Vonach H. Loeschner Hans Horner C. Stengl G. Buschbeck H. Zeininger M. Bleeker A. Benschop J. Source document Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3202-3206 Category ADC Year 2000 DOI 10.1116/1.1319688 
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Title Experimental results of the stochastic coulomb interaction in ion projection lithography. Author Jager W.H. Co-authors Derksen G. Mertens B. Cekan E. Lammer G. Vonach H. Buschbeck H. Zeininger M. Horner C. Loeschner Hans Stengl G. Bleeker A. Benschop J. Shi F. Volland B. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Heerlein H. Rangelow I.W. Kaesmaier R. Source document Journal of Vacuum Science Technology B. Vol. 17, no. 6 (1999), p. 3099-3106 Category ADC Year 1999 article