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Title Computer simulation of resist profiles at electron beam nanolithography Author Vutova Katia Co-authors Koleva Elena Mladenov Georgy Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Tanaka T. Source document Microelectronic Engineering : an international journal of semiconductor manufacturing technology. Vol. 87, (2010), p. 1108-1111 Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2010 DOI 10.1016/j.mee.2009.11.045 
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Title A simulation model for chemically amplified resist CAMP6 Author Vutova Katia Co-authors Koleva Elena Mladenov Georgy Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Tanaka T. Kawabata Keishi Source document Microelectronic Engineering : an international journal of semiconductor manufacturing technology. Vol. 86, (2009) p. 714-717 Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2009 DOI 10.1016/j.mee.2008.11.010 article
Title A simulation model for chemically amplified resist CAMP6 : abstract book Author Vutova Katia Co-authors Koleva Elena Mladenov Georgy Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Tanaka T. Kawabata Keishi Action International Conference on Micro & nano Engineering. MNE 2008 ( 34th : September 15-19, 2008 : Athens ) Source document 34th International Conference on Micro & nano Engineering : MNE 2008. -, 2008 Category AFG - Abstracts of papers from foreign conferences Year 2008 DOI 10.1016/j.mee.2008.11.010 article