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Title Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography Author Glezos N. Co-authors Argitis P. Velossiotis D. Raptis I. Hatzakis M. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Source document Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3441-3434 Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Year 2000 DOI 10.1116/1.1324615 
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Title Process optimization and diffusion lenght evaluation of a new aqueous base developable negative epoxy electron beam resist Author Glezos N. Co-authors Argitis P. Velossiotis D. Raptis I. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Action ASDAM 2000. The Third International EuroConference on Advanced Semiconductor Devices and Microsystems ( 3 : October 16-18 2000 : Smolenice Castle, Slovensko ) Source document ASDAM 2000 : 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems. P. 231-234 / Osvald Jozef 1953 ; Haščík Štefan 1956 ; Kuzmík Ján 1960 ; Breza J.. - Piscataway : IEEE, 2000 Category AFC - Published papers from foreign scientific conferences Year 2000 article