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Title Study and comparison of resist characteristics for different negative tone electron beam resist Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Koleva Elena Source document Journal of Physics: Conference Series. Vol. 2443, no. 1 (2023), art. no. 012006 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2023 DOI 10.1088/1742-6596/2443/1/012006 
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Title Study of lithographic parameters for the trilayer resist systems in electron beam lithography Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Ritomský Mário 1993- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Source document AIP Conference Proceedings. Vol. 2778 (2023), art. no. 030001 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2023 DOI 10.1063/5.0136258 article
Title Optimisation criteria for the process electron beam lithography of negative AR-N7520 resists Author Koleva Elena Co-authors Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Andok Robert 1973- SAVINFO - Ústav informatiky SAV Vutova Katia Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Source document Journal of Physics: Conference Series. Vol. 2443, no. 1 (2023), art. no. 012007 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2023 DOI 10.1088/1742-6596/2443/1/012007 article
Title Dependence of PMMA electron beam resist sidewall shape on exposure dose and resist thickness Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Koleva Elena Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Source document AIP Conference Proceedings : Applied Physics of Condensed Matter (APCOM 2021). Vol. 2411 (2021), art. no. 040001 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2021 DOI 10.1063/5.0067068 article
Title Optimization of electron beam lithography processing of resist AR-N 7520 Author Koleva Elena Co-authors Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Koleva Lilyana Vutova Katia Markova Irina Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Andok Robert 1973- SAVINFO - Ústav informatiky SAV Action VI International scientific conference INDUSTRY 4.0. Winter session : 8-11 December 2021 : Borovets, Bulgaria Source document Industry 4.0. Vol. 6, no. 5 (2021), p. 189-191 Category ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok z podujatia Year 2022 article
Title PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Koleva Elena Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Action VEIT 2019. 21st International Summer School on Vacuum, Electron and Ion Technologies : 23-27 September 2019 : Sozopol, Bulgaria Source document Journal of Physics: Conference Series. Vol. 1492 (2020), art. no. 012015 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2020 DOI 10.1088/1742-6596/1492/1/012015 File name Access Size Downloaded Type License PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters.pdf available 748.1 KB 1 Publisher's version article
Title Study of proximity effects in HSQ e-beam resist on TiO2 thin film Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV Andok Robert 1973- SAVINFO - Ústav informatiky SAV Source document ASDAM 2020 : 13th International Conference on Advanced Semiconductor Devices and Microsystems. P. 65-70. - : IEEE, 2020 / Izsák Tibor ; Vanko Gabriel 1981 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2021 DOI 10.1109/ASDAM50306.2020.9393837 File name Access Size Downloaded Type License Study of proximity effects in HSQ e-beam resist on TiO2 thin film.pdf Neprístupný/archív 280 KB 0 Publisher's version article
Title Modeling approaches for electron beam lithography Author Koleva Elena Co-authors Vutova Katia Asparuhova Boriana Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Cvetkov K. Gerasimov V. Corporation EBT 2018. 13th International Conference on Electron Beam Technologies : Varna, Bulgaria : June 18-22, 2018 Source document Journal of Physics: Conference Series. Vol. 1089 (2018), art. no. 012016 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2018 DOI 10.1088/1742-6596/1089/1/012016 URL URL link File name Access Size Downloaded Type License Modeling approaches for electron beam lithography.pdf available 809.7 KB 0 Publisher's version article
Title Experimental and theoretical study on chemically semi-amplified resist AR-P 6200 Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Andok Robert 1973- SAVINFO - Ústav informatiky SAV Barák Vladislav 1948- SAVINFO - Ústav informatiky SAV Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV Tanaka Takeshi Corporation VEIT 2017. 20th International Summer School on Vacuum, Electron and Ion Technologies : Black Sea Resort Sozopol, Bulgaria : September 25-29, 2017 Source document Journal of Physics: Conference Series. Vol. 992 (2018), art. no. 012057 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2018 DOI 10.1088/1742-6596/992/1/012057 URL URL link File name Access Size Downloaded Type License Experimental and theoretical study on chemically semi-amplified resist AR-P 6200.pdf available 1.2 MB 0 Publisher's version article
Title Simulation and experimental study on developed profiles in the positive polymer resist PMMA Author Koleva Elena Co-authors Vutova Katia Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Corporation EBT 2018. 13th International Conference on Electron Beam Technologies : Varna, Bulgaria : June 18-22, 2018 Source document Journal of Physics: Conference Series. Vol. 1089 (2018), art. no. 012015 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2018 DOI 10.1088/1742-6596/1089/1/012015 URL URL link File name Access Size Downloaded Type License Simulation and experimental study on developed profiles in the positive polymer resist PMMA.pdf available 682 KB 0 Publisher's version article