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Title Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment Author Volland B. Co-authors Shi F. Heerlein H. Rangelow I.W. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Cekan E. Vonach H. Loeschner Hans Horner C. Stengl G. Buschbeck H. Zeininger M. Bleeker A. Benschop J. Source document Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3202-3206 Category ADC Year 2000 DOI 10.1116/1.1319688 
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Title Minimum ion bean exposure dose determination for chemically amplified resist from printed dot matrices Author Bruenger W.H. Co-authors Torkler M. Weiss M. Loeschner Hans Leung K. Lee Y. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Rangelow I.W. Stangl Guenther Fallmann W. Source document Journal of Vacuum Science and Technology B. Vol. 17, no. 6 (1999), p. 3119-3121 Category ADC Year 1999 article
Title Experimental results of the stochastic coulomb interaction in ion projection lithography. Author Jager W.H. Co-authors Derksen G. Mertens B. Cekan E. Lammer G. Vonach H. Buschbeck H. Zeininger M. Horner C. Loeschner Hans Stengl G. Bleeker A. Benschop J. Shi F. Volland B. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Heerlein H. Rangelow I.W. Kaesmaier R. Source document Journal of Vacuum Science Technology B. Vol. 17, no. 6 (1999), p. 3099-3106 Category ADC Year 1999 article
Title Directly sputtered stress-compensated carbon protective layer for silicon stencil masks Author Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Co-authors Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV Držík Milan SAVSTAV - Ústav stavebníctva a architektúry SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Torres J. Wasson J. Wolfe J.C. Degen A. Rangelow I.W. Voigt D. (Dieter) Butschke J. Letzkus F. Springer R. Ehrmann A. Kaesmaier R. Kragler K. Mathuni J. Loeschner Hans Source document Journal of Vacuum Science and Technology B. Vol. 17, no. 6 (1999), p. 3127-3131 Category ADC Year 1999 article
Title DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing Author Bruenerg W. H. Co-authors Buschbeck H. Cekan E. Eder S. Fedynyshyn T. H. Hertlein W. G. Hudek Peter 1953- Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Loeschner Hans Rangelow I.W. Torkler M. Source document Microelectronic Engineering : an International Journal of Semiconductor Manufacturing Technology. Vol. 42 (1998) p. 237-240 Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 1998 DOI 10.1016/S0167-9317(98)00054-9 article