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Title Placement measurement and FE modeling results for distortion control of stencil masks Author Ehrmann A. Co-authors Kaesmaier R. Kragler K. Struck T. Haugender E. Loschner H. Lutz J. Butschke J. Letzkus F. Springer R. Držík Milan SAVSTAV - Ústav stavebníctva a architektúry SAV Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV Hudek Peter 1953- SAVINFO - Ústav informatiky SAV Degen A. Shi F. Volland B. Sossna E. Rangelow I.W. Engelstad R.L. Action 19th Annual BACUS Symposium on Photomask Technology and Management. Technical Conference Vol 3873 : September 1999 : Monterey CA, USA Source document 19th Annual BACUS Symposium on Photomask Technology and Management : Proceedings. - CA, USA, 1999 Category AFC - Published papers from foreign scientific conferences Year 1999 
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