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Title PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV Co-authors Vutova Katia Koleva Elena Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Action VEIT 2019. 21st International Summer School on Vacuum, Electron and Ion Technologies : 23-27 September 2019 : Sozopol, Bulgaria Source document Journal of Physics: Conference Series. Vol. 1492 (2020), art. no. 012015 Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2020 DOI 10.1088/1742-6596/1492/1/012015 File name Access Size Downloaded Type License PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters.pdf available 748.1 KB 1 Publisher's version 
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