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Directly sputtered stress-compensated carbon protective layer for silicon stencil masks
Názov Directly sputtered stress-compensated carbon protective layer for silicon stencil masks Autor Hudek Peter 1953- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Spoluautori Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV SCOPUS RID Držík Milan SAVSTAV - Ústav stavebníctva a architektúry SAV Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Torres J. Wasson J. Wolfe J.C. Degen A. Rangelow I.W. Voigt D. Butschke J. Letzkus F. Springer R. Ehrmann A. Kaesmaier R. Kragler K. Mathuni J. Loeschner Hans Zdroj.dok. Journal of Vacuum Science and Technology B. Vol. 17, no. 6 (1999), p. 3127-3131 Jazyk dok. eng - angličtina Druh dok. rozpis článkov z periodík (rbx) Ohlasy DIETZEL, A - BERGER, R - GRIMM, H - SCHUG, C - BRUENGER, WH - DZIONK, C - LETZKUS, F - SPRINGER, R - LOESCHNER, H - PLATZGUMMER, E - STENGL, G - ANDERS, S - BANDIC, ZZ - RETTNER, CT - TERRIS, BD - EICHHORN, H - BOEHM, M - ADAM, D. Resistless patterning of magnetic storage media using ion projection structuring. In NANOPATTERNING-FROM ULTRALARGE-SCALE INTERGRATION TO BIOTECHNOLOGY. ISSN 0272-9172, 2002, vol. 705, no., pp. 279-289. STROKAN', GP. A two-chamber facility for depositing thin films, in a transverse high-frequency discharge. In INSTRUMENTS AND EXPERIMENTAL TECHNIQUES. ISSN 0020-4412, 2003, vol. 46, no. 6, pp. 838-841. REU, PL - CHEN, CF - ENGELSTAD, RL - LOVELL, EG - BAYER, T - GRESCHNER, J - KALT, S - WEISS, H - WOOD, OR - MACKAY, RS. Electron projection lithography mask format layer stress measurement and simulation of pattern transfer distortion. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, 2002, vol. 20, no. 6, pp. 3053-3057. ITAKURA, AN - BERGER, R - NARUSHIMA, T - KITAJIMA, M. Low-energy ion-induced tensile stress of self-assembled alkanethiol monolayers. In APPLIED PHYSICS LETTERS. ISSN 0003-6951, 2002, vol. 80, no. 20, pp. 3712-3714. MANGAT, P. - MOGASB, J. - SMITH, K.H. - WASSON, J.R. Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the same. In United States Patent. 2004, no. 6749968. SYED RIZVI (Ed.) Handbook of Photomask Manufacturing Technology. Boca Raton: Taylor and Francis Group, 2005, ISBN 0-8247-5374-7. LEVINSON, H.J. Principles in lithography. SPIE - The International Society for Optical Engineering, 2007, 400 p. ISBN 08-194566-08, ISBN-13 978-08194566-01. STROKAN', G. P. Nanostructured bismuth ferrite films fabricated in transverse RF discharge. In Nanotechnologies in Russia. ISSN 19950780, 2009-02-01, 4, 1-2, pp. 79-84. LEVINSON, Harry J. Principles of lithography: Third edition. In Principles of Lithography: Third Edition, 2011-01-20, pp. 1-505. Kategória ADC Rok vykazovania 1999 Registrované v WOS Registrované v SCOPUS Registrované v CCC 
článok
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 1999 1998 1.662
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