Field emission cathode array with self aligned gate electrode fabricated by silicon micromachining

Počet záznamov: 1

Názov	Field emission cathode array with self aligned gate electrode fabricated by silicon micromachining
Autor	Barth W.
Spoluautori	Debski T.
	Shi F.
	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Biehl S.
	Iwert P.
	Grabiec P.B.
	Studzinska K.
	Mitura S.
	Bekh I.
	Lushkin A.
	Il`chenko L.
	Il`chenko V.
	Haindl G.
	Rangelow I.W.

Zdroj.dok.	Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3544-3548
Jazyk dok.	eng - angličtina
Druh dok.	rozpis článkov z periodík (rbx)
Ohlasy	CHANG, THP - MANKOS, M - LEE, KY - MURAY, LP. Multiple electron-beam lithography. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2001, vol. 57-8, no., pp. 117-135.
	CHO, B. - ISHIKAWA, T. - OSHIMA, C. Coherent and intense multibeam generation by the apex of sharp nano-objects: Electron half-circular prism. In APPLIED PHYSICS LETTERS. ISSN 0003-6951, 2007, vol. 91, no. 16, pp.
	BURT, D. P. - DOBSON, P. S. - DONALDSON, L. - WEAVER, J. M. R. A simple method for high yield fabrication of sharp silicon tips. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2008, vol. 85, no. 3, pp. 625-630.
Kategória	ADC
Rok vykazovania	2000
Registrované v	WOS
Registrované v	SCOPUS
Registrované v	CCC
DOI	10.1116/1.1324648

článok

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	A

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2000	1999	1.690

Počet záznamov: 1