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Field emission cathode array with self aligned gate electrode fabricated by silicon micromachining
Názov Field emission cathode array with self aligned gate electrode fabricated by silicon micromachining Autor Barth W. Spoluautori Debski T. Shi F. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Biehl S. Iwert P. Grabiec P.B. Studzinska K. Mitura S. Bekh I. Lushkin A. Il`chenko L. Il`chenko V. Haindl G. Rangelow I.W. Zdroj.dok. Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3544-3548 Jazyk dok. eng - angličtina Druh dok. rozpis článkov z periodík (rbx) Ohlasy CHANG, THP - MANKOS, M - LEE, KY - MURAY, LP. Multiple electron-beam lithography. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2001, vol. 57-8, no., pp. 117-135. CHO, B. - ISHIKAWA, T. - OSHIMA, C. Coherent and intense multibeam generation by the apex of sharp nano-objects: Electron half-circular prism. In APPLIED PHYSICS LETTERS. ISSN 0003-6951, 2007, vol. 91, no. 16, pp. BURT, D. P. - DOBSON, P. S. - DONALDSON, L. - WEAVER, J. M. R. A simple method for high yield fabrication of sharp silicon tips. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2008, vol. 85, no. 3, pp. 625-630. Kategória ADC Rok vykazovania 2000 Registrované v WOS Registrované v SCOPUS Registrované v CCC DOI 10.1116/1.1324648 článok
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2000 1999 1.690
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