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The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS

  1. TitleThe application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS
    Author Volland B.
    Co-authors Heerlein H.

    		Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV    SCOPUS    RID    ORCID

    		Rangelow I.W.

    Source document Microelectronic Engineering. Vol. 57-58 (2001), p. 641-650
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
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    DOCKER, PT - KINNELL, PK - WARD, MCL. Development of the one-step DRIE dry process for unconstrained fabrication of released MEMS devices. In JOURNAL OF MICROMECHANICS AND MICROENGINEERING. ISSN 0960-1317, 2004, vol. 14, no. 7, pp. 941-944.
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    ZHANG, Cong Chun - YANG, Chun Sheng - DING, Gui Fu - MAO, Hai Ping - NI, Zhi Ping. Study on deep reactive ion etching of commercial polymethlmethacrylate film. In Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University. ISSN 10062467, 2004-10-01, 38, sUPPL. 2, pp. 118-121.
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    COOPER, A. - DOCKER, P. T. - WARD, M. C. A novel method of fabricating optical gratings using the one step DRIE process on SOI wafers. In 2005 NSTI Nanotechnology Conference and Trade Show NSTI Nanotech 2005 Technical Proceedings, 2005-12-01, pp. 508-510.
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    XIE, Jianbing - HAO, Yongcun - CHANG, Honglong - YUAN, Weizheng. Single Mask Selective Release Process for Complex SOI MEMS Device. In MICRO-NANO TECHNOLOGY XIV, PTS 1-4. ISSN 1013-9826, 2013, vol. 562-565, no., pp. 1116-1121.
    YANG ZHENCHUAN - WEI YUMIN - MAO XU - YAN GUIZHEN. A single-mask dry-release process for fabrication of high aspect ratio SOI MEMS devices. In SCIENCE CHINA-TECHNOLOGICAL SCIENCES. ISSN 1674-7321, 2013, vol. 56, no. 2, pp. 387-391.
    HA, Joon-Geun - LEE, Seung-Ki - BAI, Seoung-Jai - KIM, Yong-Kweon - PARK, Jae-Hyoung. Conductive microtip electrode array with variable aspect ratio using combination process of reactive ion etching. In JOURNAL OF MICROMECHANICS AND MICROENGINEERING. ISSN 0960-1317, 2013, vol. 23, no. 11, pp.
    STOHR, Frederik - MICHAEL-LINDHARD, Jonas - HUBNER, Jorg - JENSEN, Flemming - SIMONS, Hugh - JAKOBSEN, Anders Clemen - POULSEN, Henning Friis - HANSEN, Ole. Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, 2015, vol. 33, no. 6, pp.
    ZHU, Yicheng - WANG, Wenjuan - YU, Feilong - LIU, Qingquan - GUO, Zilu - LI, Guanhai - CHEN, Pingping - LU, Wei. The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method. In MICROMACHINES, 2022, vol. 13, no. 9, pp. Dostupné na: https://doi.org/10.3390/mi13091531.
    ZHU, Y.C. - WANG, W.J. - ZHOU, M. - QU, H.D. - LI, G.H. - CHEN, P.P. - LU, W. The study and optimization of ICP deep etching at a low-temperature for InP solid-immersion metalens fabrication. In MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. ISSN 1369-8001, NOV 1 2023, vol. 166. Dostupné na: https://doi.org/10.1016/j.mssp.2023.107700.
    HU, W.H. - WANG, Z.H. - PAN, A.X. - CUI, B. High aspect ratio silicon ring-shape micropillars fabricated by deep reactive ion etching with sacrificial structures. In MICRO AND NANO ENGINEERING. MAR 2024, vol. 22. Dostupné na: https://doi.org/10.1016/j.mne.2023.100234.
    CategoryADC
    Year2001
    Registered inWOS
    Registered inSCOPUS
    Registered inCCC
    článok

    článok

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    A
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2001
Počet záznamov: 1  

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