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Epitaxial growth of low-resistivity RuO2 films on (1 1 0 2)-oriented Al2O3 substrate
Názov Epitaxial growth of low-resistivity RuO2 films on (1 1 0 2)-oriented Al2O3 substrate Autor Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV ORCID Spoluautori Machajdík Daniel SAVELEK - Elektrotechnický ústav SAV Cambel Vladimír 1956 SAVELEK - Elektrotechnický ústav SAV ORCID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Pignard S. Zdroj.dok. Journal of Crystal Growth. Vol. 235 (2002), p. 377-383 Jazyk dok. eng - angličtina Krajina NL - Holandsko Druh dok. rozpis článkov z periodík (rbx) Ohlasy LAI, YH - CHEN, YL - CHI, Y - LIU, CS - CARTY, AJ - PENG, SM - LEE, GH. Deposition of Ru and RuO2 thin films employing dicarbonyl bis-diketonate ruthenium complexes as CVD source reagents. In JOURNAL OF MATERIALS CHEMISTRY. ISSN 0959-9428, 2003, vol. 13, no. 8, pp. 1999-2006. LAI, YH - CHOU, TY - SONG, YH - LIU, CS - CHI, Y - CARTY, AJ - PENG, SM - LEE, GH. Synthesis and characterization of ruthenium complexes with two fluorinated amino alkoxide chelates. The quest to design suitable MOCVD source reagents. In CHEMISTRY OF MATERIALS. ISSN 0897-4756, 2003, vol. 15, no. 12, pp. 2454-2462. NORTON, DP. Synthesis and properties of epitaxial electronic oxide thin-film materials. In MATERIALS SCIENCE & ENGINEERING R-REPORTS. ISSN 0927-796X, 2004, vol. 43, no. 5-6, pp. 139-247. CHOU, TY - LAI, YH - CHEN, YL - CHI, Y - PRASAD, KR - CARTY, AJ - PENG, SM - LEE, GH. Synthesis and characterization of tris(beta-ketoiminato)ruthenium(III) complexes: Potential precursors for CVD of Ru and RuO2 thin films. In CHEMICAL VAPOR DEPOSITION. ISSN 0948-1907, 2004, vol. 10, no. 3, pp. 149-158. STRINGFELLOW, G. B. Development and current status of organometallic vapor phase epitaxy. In Journal of Crystal Growth. ISSN 00220248, 2004-03-31, 264, 4, pp. 620-630. MIAO, GX - GUPTA, A - XIAO, G - ANGUELOUCH, A. Epitaxial growth of ruthenium dioxide films by chemical vapor deposition and its comparison with similarly grown chromium dioxide films. In THIN SOLID FILMS. ISSN 0040-6090, 2005, vol. 478, no. 1-2, pp. 159-163. Schneider, A.W. Doktor-Ingenieur Arbeit. Erlangen: Technischen Fakultät der Univ. Erlangen-Nürnberg. 2006. SCHNEIDER, Andreas - POPOVSKA, Nadejda - JIPA, Ilona - ATAKAN, Burak - SIDDIQI, M. Aslam - SIDDIQUI, Rehan - ZENNECK, Ulrich. Minimizing the carbon content of thin ruthenium films by MOCVD precursor complex design and process control. In CHEMICAL VAPOR DEPOSITION. ISSN 0948-1907, 2007, vol. 13, no. 8, pp. 389-395. NOWAKOWSKI, P. - VILLAIN, S. - AGUIR, K. - GUERIN, J. - KOPIA, A. - KUSINSKI, J. - GUINNETON, F. - GAVARRI, J.R. Microstructure and electrical properties of RuO2-CeO2 composite thin films. In THIN SOLID FILMS. ISSN 0040-6090, 2010, vol. 518, no. 10, pp. 2801-2807. JIPA, Ilona - SIDDIQI, M. Aslam - SIDDIQUI, Rehan A. - ATAKAN, Burak - MARBACH, Hubertus - CREMER, Till - MAIER, Florian - STEINRUECK, Hans-Peter - DANOVA, Katia - POPOVSKA, Nadejda - HEINEMANN, Frank W. - ZENNECK, Ulrich. Methylated [(benzene)(1,3-butadiene)Ru-0] Derivatives as Novel MOCVD Precursors with Favorable Properties. In CHEMICAL VAPOR DEPOSITION. ISSN 0948-1907, 2011, vol. 17, no. 1-3, pp. 15-21. JIPA, Ilona - DANOVA, Katya - POPOVSKA, Nadejda - SIDDIQI, M. Aslam - SIDDIQUI, Rehan A. - ATAKAN, Burak - CREMER, Till - MAIER, Florian - MARBACH, Hubertus - STEINRUECK, Hans-Peter - HEINEMANN, Frank W. - ZENNECK, Ulrich. Methylated [(arene)(1,3-cyclohexadiene)Ru(0)] complexes as low-melting MOCVD precursor complexes with a controlled follow-up chemistry of the ligands. In JOURNAL OF MATERIALS CHEMISTRY. ISSN 0959-9428, 2011, vol. 21, no. 9, pp. 3014-3024. TUCHSCHERER, Andre - GEORGI, Colin - ROTH, Nina - SCHAARSCHMIDT, Dieter - RUEFFER, Tobias - WAECHTLER, Thomas - SCHULZ, Stefan E. - OSWALD, Steffen - GESSNER, Thomas - LANG, Heinrich. Ruthenocenes and Half-Open Ruthenocenes: Synthesis, Characterization, and Their Use as CVD Precursors for Ruthenium Thin Film Deposition. In EUROPEAN JOURNAL OF INORGANIC CHEMISTRY. ISSN 1434-1948, 2012, vol., no. 30, pp. 4867-4876. ARROVAL, T. Kasvutingimuste ja-aluste mõju TiO2 aatomkihtsadestumisele. Master's Thesis, Tartu Ülikool. 2012, 68 p. JUNG, Woonghyun - KIM, Hyeonsoo - DHO, Joonghoe. Synthesis and characterization of metallic RuO2 heteroepitaxy films on sapphire substrates. In New Physics: Sae Mulli. ISSN 03744914, 2017-06-01, 67, 6, pp. 696-702. HERDIECH, Matthew W. - KAKEKHANI, Arvin - ZHU, Xiaodong - ISMAIL-BEIGI, Sohrab - ALTMAN, Eric. Growth of ultrathin Ru oxide films on perovskite and corundum substrates. In SURFACE SCIENCE. ISSN 0039-6028, 2019, vol. 688, no., pp. 51-62. Kategória ADCA - Vedecké práce v zahraničných karentovaných časopisoch impaktovaných Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2002 Registrované v WOS Registrované v SCOPUS DOI 10.1016/S0022-0248(01)01907-8 
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Počet záznamov: 1