Počet záznamov: 1
Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors
Názov Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors Autor Aarik L. Spoluautori Arroval T. Rammula R. Mändar H. Sammelselg V. Hudec Boris SAVELEK - Elektrotechnický ústav SAV ORCID Hušeková Kristína 1957 SAVELEK - Elektrotechnický ústav SAV Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV ORCID Aarik J. Zdroj.dok. Thin Solid Films. Vol. 565, (2014), p. 19-24 Jazyk dok. eng - angličtina Druh dok. rozpis článkov z periodík (rbx) Ohlasy WINZER, A. - SZABO, N. - WACHOWIAK, A. - JORDAN, P.M. - HEITMANN, J. - MIKOLAJICK, T. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. JAN 2015, vol. 33, no. 1. SIMON, D.K. - JORDAN, P.M. - KNAUT, M. - CHOHAN, T. - MIKOLAJICK, T. - DIRNSTORFER, I. In 2015 IEEE 42ND PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC). 2015. KUKLI, K. - KEMELL, M. - KOYKKA, J. - MIZOHATA, K. - VEHKAMAKI, M. - RITALA, M. - LESKELA, M. In THIN SOLID FILMS. AUG 31 2015, vol. 589, p. 597-604. TESTONI, G.E. - CHIAPPIM, W. - PESSOA, R.S. - FRAGA, M.A. - MIYAKAWA, W. - SAKANE, K.K. - GALVAO, N.K.A.M. - VIEIRA, L. - MACIEL, H.S. In JOURNAL OF PHYSICS D-APPLIED PHYSICS. SEP 21 2016, vol. 49, no. 37. AICH, S. - MISHRA, M.K. - SEKHAR, C. - SATAPATHY, D. - ROY, B. In MATERIALS LETTERS. SEP 1 2016, vol. 178, p. 135-139. DIRNSTORFER, I. - MIKOLAJICK, T. In NANOMATERIALS FOR SUSTAINABLE ENERGY. 2016, p. 41-94. DIRNSTORFER, I. - CHOHAN, T. - JORDAN, P.M. - KNAUT, M. - SIMON, D.K. - BARTHA, J.W. - MIKOLAJICK, T. In IEEE JOURNAL OF PHOTOVOLTAICS. JAN 2016, vol. 6, no. 1, p. 86-91. Lee, G.-H., Seol, J.-H., An, J.-K., Yun, J.-Y., Hahm, S.-H. In ECS Transactions Volume 75, Issue 11, 2016, Pages 53-58 LEE, G.H. - SEOL, J.H. - AN, J.K. - YUN, J.Y. - HAHM, S.H. In LOW-DIMENSIONAL NANOSCALE ELECTRONIC AND PHOTONIC DEVICES 9. 2016, vol. 75, no. 11, p. 53-58. BAO, Y.M. - LAITINEN, M. - SAJAVAARA, T. - SAVIN, H. In ADVANCED ELECTRONIC MATERIALS. JUN 2017, vol. 3, no. 6, SI. YURKEVICH, O. - MAKSIMOVA, K. - GOIKHMAN, A. - GRUNIN, A. - PROKOPOVICH, P. - TYURIN, A. - MEDVEDSKAYA, P. - LYATUN, I. - SNIGIREVA, I. - SNIGIREV, A. In JOURNAL OF SYNCHROTRON RADIATION. JUL 2017, vol. 24, 4, p. 775-780. NIEMELA, J.P. - MARIN, G. - KARPPINEN, M. In SEMICONDUCTOR SCIENCE AND TECHNOLOGY. SEP 2017, vol. 32, no. 9. GUERRA-NUNEZ, C. - DOBELI, M. - MICHLER, J. - UTKE, I. In CHEMISTRY OF MATERIALS. OCT 24 2017, vol. 29, no. 20, p. 8690-8703. ATAY, F. - AKYUZ, I. - CERGEL, M.S. - ERDOGAN, B. Production and Characterization of (004) Oriented Single Anatase TiO2 Films. In JOURNAL OF ELECTRONIC MATERIALS. FEB 2018, vol. 47, no. 2, p. 1601-1610. DIGDAYA, I.A. - TRZESNIEWSKI, B.J. - ADHYAKSA, G.W.P. - GARNETT, E.C. - SMITH, W.A. General Considerations for Improving Photovoltage in Metal-Insulator-Semiconductor Photoanodes. In JOURNAL OF PHYSICAL CHEMISTRY C. MAR 15 2018, vol. 122, no. 10, p. 5462-5471. LALE, A. - SCHEID, E. - CRISTIANO, F. - DATAS, L. - REIG, B. - LAUNAY, J. - TEMPLE-BOYER, P. Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: Investigation of interfacial and structural properties. In THIN SOLID FILMS. NOV 30 2018, vol. 666, p. 20-27. CERGEL, Muge Soyleyici - ATAY, Ferhunde. The role of the annealing process in different gas environments on the degradation of the methylene blue organic pollutant by brookite-TiO2 photocatalyst. In IONICS. ISSN 0947-7047, 2019, vol. 25, no. 8, pp. 3823-3836. ATAY, F. - DURMAZ, D. Structural, Optical and Surface Properties of Multilayer Anatase-TiO(2)Films Grown by Sol-Gel Spin Coating Technique. In JOURNAL OF ELECTRONIC MATERIALS. ISSN 0361-5235, SEP 2020, vol. 49, no. 9, SI, p. 5542-5551. BERGHUIS, W.J.H. - MELSKENS, J. - MACCO, B. - BASUVALINGAM, S.B. - VERHEIJEN, M.A. - KESSELS, W.M.M. Atomic layer deposition of Nb-doped TiO2: Dopant incorporation and effect of annealing. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. ISSN 0734-2101, MAR 2020, vol. 38, no. 2. GHAZARYAN, Lilit - HANDA, Shiti - SCHMITT, Paul - BELADIYA, Vivek - RODDATIS, Vladimir - TUENNERMANN, Andreas - SZEGHALMI, Adriana. Structural, optical, and mechanical properties of TiO2 nanolaminates. In NANOTECHNOLOGY, 2021, vol. 32, no. 9, pp. ISSN 0957-4484. Dostupné na: https://doi.org/10.1088/1361-6528/abcbc1. KWON, Dae Seon - JEON, Woojin - KIM, Dong Gun - KIM, Tae Kyun - SEO, Haengha - LIM, Junil - HWANG, Cheol Seong. Improved Properties of the Atomic Layer Deposited Ru Electrode for Dynamic Random-Access Memory Capacitor Using Discrete Feeding Method. In ACS APPLIED MATERIALS & INTERFACES, 2021, vol. 13, no. 20, pp. 23915-23927. ISSN 1944-8244. Dostupné na: https://doi.org/10.1021/acsami.1c03795. CHIAPPIM, William - TESTONI, Giorgio - MIRANDA, Felipe - FRAGA, Mariana - FURLAN, Humber - SARAVIA, David Ardiles - SOBRINHO, Argemiro da Silva - PETRACONI, Gilberto - MACIEL, Homero - PESSOA, Rodrigo. Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating. In MICROMACHINES, 2021, vol. 12, no. 6, pp. Dostupné na: https://doi.org/10.3390/mi12060588. LALE, A. - JOLY, M. - MEKKAOUI, S. - JOLY, X. - SCHEID, E. - LAUNAY, J. - TEMPLE-BOYER, Pierre. Effect of thermal annealing on the dielectric, passivation and pH detection properties of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition. In THIN SOLID FILMS, 2021, vol. 732, no., pp. ISSN 0040-6090. Dostupné na: https://doi.org/10.1016/j.tsf.2021.138761. KIM, Byunguk - CHOI, Yeonsik - LEE, Dahyun - BYUN, Younghun - JUNG, Chanwon - JEON, Hyeongtag. Leakage Current Characteristics of Atomic Layer Deposited Al-Doped TiO2 Thin Film for Dielectric in DRAM Capacitor. In ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2021, vol. 10, no. 8, pp. ISSN 2162-8769. Dostupné na: https://doi.org/10.1149/2162-8777/ac1c9c. Kategória ADCA - Vedecké práce v zahraničných karentovaných časopisoch impaktovaných Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2014 Registrované v WOS Registrované v SCOPUS Registrované v CCC DOI 10.1016/j.tsf.2014.06.038 
článok
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2014 2013 1.867 Q2 0.818 Q1
Počet záznamov: 1