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Study of the new CSAR62 positive tone electron-beam resist at 40 keV electron energy
Názov Study of the new CSAR62 positive tone electron-beam resist at 40 keV electron energy Autor Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Spoluautori Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Vutova Katia Koleva Elena Nemec Pavel SAVINFO - Ústav informatiky SAV Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV SCOPUS RID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Mladenov Georgy Zdroj.dok. Journal of Physics: Conference Series. Vol. 700 (2016), art. no. 012030 Jazyk dok. eng - angličtina Poznámky 19th Summer School on Vacuum, Electron and Ion Technologies (VEIT2015), Sozopol, Bulgaria, September 2015 Druh dok. rozpis článkov z periodík (rbx) Ohlasy BALLING, P. - CHRISTIANSEN, J. - CHRISTIANSEN, R. E. - ERIKSEN, E. - LAKHOTIYA, H. - MIRSAFAEI, M. - MOLLER, S. H. - NAZIR, A. - VESTER-PETERSEN, J. - JEPPESEN, B. R. - JENSEN, P. B. - HANSEN, J. L. - RAM, S. K. - SIGMUND, O. - MADSEN, M. - MADSEN, S. P. - JULSGAARD, B. Improving the efficiency of solar cells by upconverting sunlight using field enhancement from optimized nano structures. In OPTICAL MATERIALS. ISSN 0925-3467, 2018, vol. 83, no., pp. 279-289. INDYKIEWICZ, Kornelia - PASZKIEWICZ, Bogdan - PASZKIEWICZ, Regina. SUBSTRATE EFFECT IN ELECTRON BEAM LITHOGRAPHY. In ADVANCES IN ELECTRICAL AND ELECTRONIC ENGINEERING. ISSN 1336-1376, 2018, vol. 16, no. 2, pp. 246-252. OZAKI, Yuki - ITO, Shunya - HIROSHIBA, Nobuya - NAKAMURA, Takahiro - NAKAGAWA, Masaru. Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina. In JAPANESE JOURNAL OF APPLIED PHYSICS. ISSN 0021-4922, 2018, vol. 57, no. 6, pp. TANIGUCHI, J. Electron-beam machining. In: J. Yan (ed.): Micro and Nano Fabrication Technology. Springer, Singapore. ISBN 978-981-10-6588-0, 2018, vol. 1, pp. 1-21. XU, Jian - WANG, Ang - DAN, Yaping. Plasmonic micropipe spectral filters in mid-infrared. In OPTICS LETTERS. ISSN 0146-9592, 2019, vol. 44, no. 18, pp. 4479-4482. GUO, Shuya - CHEN, Qi - PAN, Danfeng - WU, Yaojun - TU, Xuecou - HE, Guanglong - HAN, Hang - LI, Feiyan - JIA, Xiaoqing - ZHAO, Qingyuan - ZHANG, Hengbin - BEI, Xiaomin - XIE, Jun - ZHANG, Labao - CHEN, Jian - KANG, Lin - WU, Peiheng. Fabrication of superconducting niobium nitride nanowire with high aspect ratio for X-ray photon detection. In SCIENTIFIC REPORTS. ISSN 2045-2322, 2020, vol. 10, no. 1, pp. KESER, Yasemen Ince - YILDIRIM, Kubra Saka - GOKCEN, Dincer. Patterning Titanium Dioxide Based Memristors Using Electron Beam Lithography. In 2ND INTERNATIONAL CONGRESS ON HUMAN-COMPUTER INTERACTION, OPTIMIZATION AND ROBOTIC APPLICATIONS (HORA 2020), 2020, vol., no., pp. 241-248. ZAWADZKA, Agnieszka - INDYKIEWICZ, Kornelia - PASZKIEWICZ, Regina. THE VALIDATION OF VARIOUS TECHNOLOGICAL FACTORS IMPACT ON THE ELECTRON BEAM LITHOGRAPHY PROCESS. In ADVANCES IN ELECTRICAL AND ELECTRONIC ENGINEERING. ISSN 1336-1376, 2021, vol. 19, no. 2, pp. 186-191. Dostupné na: https://doi.org/10.15598/aeee.v19i2.4133. MAILLARD, Damien - BENES, Zdenek - PIACENTINI, Niccolò - VILLANUEVA, Luis Guillermo. Electron-beam lithography on M108Y and M35G chemically amplified DUV photoresists. In Micro and Nano Engineering, 2021-11-01, 13, pp. Dostupné na: https://doi.org/10.1016/j.mne.2021.100095. OHLIN, H. - FRISK, T. - VOGT, U. Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns. In MICROMACHINES. APR 2023, vol. 14, no. 4. Dostupné na: https://doi.org/10.3390/mi14040766. Kategória ADMB - Vedecké práce v zahraničných neimpaktovaných časopisoch registrovaných vo WOS Core Collection alebo SCOPUS Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2016 Registrované v WOS Registrované v SCOPUS DOI 10.1088/1742-6596/700/1/012030 
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Názov súboru Prístup Veľkosť Stiahnuté Typ Licence Study of the new CSAR62 positive tone electron-beam resist at 40 keV electron energy.pdf Prístupný 1.8 MB 4 Vydavateľská verzia rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2016 2015 0.252 Q3
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