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Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies
Názov Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies Autor Škriniarová Jaroslava Spoluautori Pudiš D. Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Lettrichová I. Uherek F. Zdroj.dok. Applied Surface Science. Vol. 395 (2017), p. 226-231 Jazyk dok. eng - angličtina Druh dok. rozpis článkov z periodík (rbx) Ohlasy TOBING, Landobasa Y. M. - MUELLER, Aaron D. - TONG, Jinchao - ZHANG, Dao Hua. Nanobridges formed through electron beam image reversal lithography for plasmonic mid-infrared resonators with high aspect ratio nanogaps. In NANOTECHNOLOGY. ISSN 0957-4484, 2019, vol. 30, no. 42, pp. DAUD, Nurulhaidah - RAZAK, Nor Farhah - ABD RAHMAN, Normahirah Nek - ZAHIDI, Azizah Mohd - CHIN, Siew Xian - MUDA, Tengku Elmi Azlina Tengku - SYONO, Mohd Ismahadi. Image Reversal Resist Photolithography of Silicon-Based Platinum and Silver Microelectrode Pattern. In SAINS MALAYSIANA. ISSN 0126-6039, 2021, vol. 50, no. 2, pp. 515-523. LIANG WENYAO - YANG JIAQI - LI ZHIYUAN. Numerical Simulation on Fabricating Compound Photonic Crystals by Multi-Beam Holographic Interferometry. In ACTA OPTICA SINICA. ISSN 0253-2239, 2021, vol. 41, no. 11, pp. Dostupné na: https://doi.org/10.3788/AOS202141.1116002. WANG, Xuewen - YUAN, Jinpeng - WANG, Lirong - XIAO, Liantuan - JIA, Suotang. Enhanced frequency up-conversion based on four-wave mixing assisted by a Bessel-Gaussian beam in Rb-85 atoms. In OPTICS AND LASER TECHNOLOGY, 2022, vol. 149, no., pp. ISSN 0030-3992. Dostupné na: https://doi.org/10.1016/j.optlastec.2022.107874. XU, Guo-Juan - LI, Qian-Hua - CHENG, Chang - ZOU, Rong - LI, Xiao-Jie - MA, Ren-De - CAO, Hong-Zhong. Two-photon nanolithography of positive photoresist of AZ 5214E with a spatial resolution at nanoscale. In JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2023, vol. 22, no. 1, pp. ISSN 1932-5150. Dostupné na: https://doi.org/10.1117/1.JMM.22.1.013001. YU, K.C. - TIAN, H. - LI, R. - HAO, L.Z. - ZHANG, K.M. - ZHU, X.D. - MA, Y.Q. - MA, L. Electron-Beam Direct Writing-Based High-Performance Graphene Electrode Fabrication. In ACS APPLIED ELECTRONIC MATERIALS. SEP 5 2023, vol. 5, no. 9, p. 5187-5192. Dostupné na: https://doi.org/10.1021/acsaelm.3c00917. Kategória ADCA - Vedecké práce v zahraničných karentovaných časopisoch impaktovaných Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2017 Registrované v WOS Registrované v SCOPUS Registrované v CCC DOI 10.1016/j.apsusc.2016.06.141 
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Názov súboru Prístup Veľkosť Stiahnuté Typ Licence Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies.pdf Neprístupný/archív 1.8 MB 1 Vydavateľská verzia rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2017 2016 3.387 Q1 0.958 Q1
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