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Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold
Názov Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold Autor Makhotkin Igor Spoluautori Milov Igor Chalupský Jaromír Tiedtke Kai de Vries Gosse Saksl Karel 1974 SAVMATVY - Ústav materiálového výskumu SAV SCOPUS ORCID Zdroj.dok. Journal of the Optical Society of America B: Optical Physics. Vol. 35, no. 11 (2018), p. 2799-2805 Jazyk dok. eng - angličtina Krajina US - Spojené štáty Druh dok. rozpis článkov z periodík (rbx) Ohlasy LI, Wenbin - ZHANG, Zhe - PAN, Liuyang - HUANG, Qiushi - ZHANG, Zhong - YI, Shengzhen - XIE, Chun - WANG, Zhanshan. Table-top Focused EUV Optical System with High Energy Density and its Application on EUV Damage Tests. In OPTICS DAMAGE AND MATERIALS PROCESSING BY EUV/X-RAY RADIATION VII. ISSN 0277-786X, 2019, vol. 11035, no., pp. ISHINO, Masahiko - THANH-HUNG DINH - HOSAKA, Yuji - HASEGAWA, Noboru - YOSHIMURA, Kimio - YAMAMOTO, Hiroki - HATANO, Tadashi - HIGASHIGUCHI, Takeshi - SAKAUE, Kazuyuki - ICHIMARU, Satoshi - HATAYAMA, Masatoshi - SASAKI, Akira - WASHIO, Masakazu - NISHIKINO, Masaharu - MAEKAWA, Yasunari. Soft x-ray laser beamline for surface processing and damage studies. In APPLIED OPTICS. ISSN 1559-128X, 2020, vol. 59, no. 12, pp. 3692-3698. SAKAUE, Kazuyuki - MOTOYAMA, Hiroto - HAYASHI, Ryosuke - IWASAKI, Atsushi - MIMURA, Hidekazu - YAMANOUCHI, Kaoru - SHIBUYA, Tatsunori - ISHINO, Masahiko - DINH, Thanh-Hung - OGAWA, Hiroshi - HIGASHIGUCHI, Takeshi - NISHIKINO, Masaharu - KURODA, Ryunosuke. Surface processing of PMMA and metal nano-particle resist by sub-micrometer focusing of coherent extreme ultraviolet high-order harmonics pulses. In OPTICS LETTERS. ISSN 0146-9592, 2020, vol. 45, no. 10, pp. 2926-2929. LI, Wenbin - LI, Shuhui - PAN, Liuyang - ZHANG, Zhe - XIE, Chun - HUANG, Qiushi - WANG, Zhanshan. Nanosecond extreme ultraviolet radiation damage on thin film mirrors. In Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2022-11-01, 30, 21, pp. 2698-2710. ISSN 1004924X. Dostupné na: https://doi.org/10.37188/OPE.20223021.2698. Kategória ADCA - Vedecké práce v zahraničných karentovaných časopisoch impaktovaných Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2018 Registrované v WOS Registrované v SCOPUS Registrované v CCC DOI 10.1364/JOSAB.35.002799 
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Názov súboru Prístup Veľkosť Stiahnuté Typ Licence Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond.pdf Prístupný 2.7 MB 2 Autorský preprint rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2018 2017 2.048 Q2 0.859 Q1
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