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Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching
Názov Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching Autor Marton Marián Spoluautori Ritomský Mário 1993- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Michniak P. Behúl Miroslav Řeháček V. Redhammer R. Vincze A. Papula Martin Vojs M. Zdroj.dok. Vacuum. Vol. 170 (2019), art. no. 108954 Jazyk dok. eng - angličtina Druh dok. rozpis článkov z periodík (rbx) Ohlasy CUI, Naiyuan - WANG, Fei - GUO, Lei. Catalytic etching of {100}-oriented diamond coating with Ni and Cu nanoparticles under hydrogen. In INTERNATIONAL JOURNAL OF MODERN PHYSICS B. ISSN 0217-9792, 2020, vol. 34, no. 8, pp. ZOLOTUKHIN, D. B. - OKS, E. M. - TYUNKOV, A. - YAKOVLEV, E. - YUSHKOV, Yu G. Effect of a dielectric cavity on the ion etching of dielectrics by electron beam-produced plasma generated by a forevacuum plasma electron source. In VACUUM. ISSN 0042-207X, 2021, vol. 192, no., pp. LIU, Fangmu - DENG, Zejun - MIAO, Dongtian - CHEN, Weipeng - WANG, Yijia - ZHOU, Kechao - MA, Li - WEI, Qiuping. A highly stable microporous boron-doped diamond electrode etched by oxygen plasma for enhanced electrochemical ozone generation. In JOURNAL OF ENVIRONMENTAL CHEMICAL ENGINEERING, 2021, vol. 9, no. 6, pp. ISSN 2213-2929. Dostupné na: https://doi.org/10.1016/j.jece.2021.106369. CHEN, Yu Chih - LI, Bing Chang - HSU, Pei Ling - LIN, Tsung Yi - CHEN, I. An - LIN, Chun Hung - HSU, Hsin Cheng - YEH, Chin Chih - LIAN, Nan Tzu - YANG, Ta Hone - CHEN, Kuang Chao. Plasma Etching Pre-treatment for a TEM Lamella Preparation of 3D NAND with High Aspect Ratio. In Conference Proceedings from the International Symposium for Testing and Failure Analysis, 2021-01-01, 2021-October, pp. 141-145. Dostupné na: https://doi.org/10.31399/asm.cp.istfa2021p0141. ZHENG, Yuting - LIU, Yanhui - WANG, Lin - LIU, Jinlong - WEI, Junjun - CHEN, Liangxian - AN, Kang - ZHANG, Xiaotong - YE, Haitao - ZHOU, Haojun - TAO, Hongliang - YIN, Yuhang - OUYANG, Xiaoping - LI, Chengming. Vertically Aligned Boron-Doped Diamond Hollow Nanoneedle Arrays for Enhanced Field Emission. In ACS APPLIED NANO MATERIALS, 2022, vol., no., pp. Dostupné na: https://doi.org/10.1021/acsanm.2c02180. ZHENG, Yuting - JIA, Yanwei - LIU, Jinlong - WEI, Junjun - CHEN, Liangxian - AN, Kang - YAN, Xiongbo - ZHANG, Xiaotong - YE, Haitao - OUYANG, Xiaoping - LI, Chengming. Surface etching evolution of mechanically polished single crystal diamond with subsurface cleavage in microwave hydrogen plasma: Topography, state and electrical properties. In VACUUM, 2022, vol. 199, no., pp. ISSN 0042-207X. Dostupné na: https://doi.org/10.1016/j.vacuum.2022.110932. SUMAN, S. - SHARMA, D.K. - SAIN, S. - SZABO, O. - SETHY, S.K. - RAKESH, B. - BALAJI, U. - MARTON, M. - VOJS, M. - ROY, S.S. - SAKTHIVEL, R. - SANKARAN, K.J. - KROMKA, A. Nanoscale Investigation on the Improvement of Electrical Properties of Boron-Doped Diamond Nanostructures for High-Performance Plasma Displays. In ACS APPLIED ELECTRONIC MATERIALS. SEP 12 2023, vol. 5, no. 9, p. 4946-4958. Dostupné na: https://doi.org/10.1021/acsaelm.3c00713. Kategória ADCA - Vedecké práce v zahraničných karentovaných časopisoch impaktovaných Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2020 Registrované v WOS Registrované v SCOPUS Registrované v CCC DOI 10.1016/j.vacuum.2019.108954 
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Názov súboru Prístup Veľkosť Stiahnuté Typ Licence Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching.pdf Prístupný 5.2 MB 2 Vydavateľská verzia rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2019 2018 2.515 Q2 0.581 Q2
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