Experimental results of the stochastic coulomb interaction in ion projection lithography.

Počet záznamov: 1

Názov	Experimental results of the stochastic coulomb interaction in ion projection lithography.
Autor	Jager W.H.
Spoluautori	Derksen G.
	Mertens B.
	Cekan E.
	Lammer G.
	Vonach H.
	Buschbeck H.
	Zeininger M.
	Horner C.
	Loeschner Hans
	Stengl G.
	Bleeker A.
	Benschop J.
	Shi F.
	Volland B.
	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Heerlein H.
	Rangelow I.W.
	Kaesmaier R.

Zdroj.dok.	Journal of Vacuum Science Technology B. Vol. 17, no. 6 (1999), p. 3099-3106
Jazyk dok.	eng - angličtina
Krajina	US - Spojené štáty
Druh dok.	rozpis článkov z periodík (rbx)
Ohlasy	GOLLADAY, SD - PFEIFFER, HC - ROCKROHR, JD - STICKEL, W. PREVAIL Alpha system: Status and design considerations. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, 2000, vol. 18, no. 6, pp. 3072-3078.
	JIANG, X. Resolution improvement and pattern generator development for the maskless micro-ion-beam reduction lithography system. PHD Thesis, University of California, Berkeley. 2006, 184 p.
	KRUIT, Pieter - JANSEN, Guus H. Space charge and statistical coulomb effects. In Handbook of Charged Particle Optics, Second Edition, 2017-12-19, pp. 341-389.
	XU, Yuan - WANG, Changyu - WANG, Yongtian - LIU, Juan. Review of Design Methods of Diffractive Optical Element. In Guangxue Xuebao/Acta Optica Sinica, 2023-04-01, 43, 8, pp. ISSN 02532239. Dostupné na: https://doi.org/10.3788/AOS230557.
Kategória	ADC
Rok vykazovania	1999
Registrované v	WOS
Registrované v	SCOPUS
Registrované v	CCC

článok

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	A

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
1999	1998	1.662

Počet záznamov: 1