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Dry etching characteristics of TiO2 thin films using inductively coupled plasma for gas sensing
Názov Dry etching characteristics of TiO2 thin films using inductively coupled plasma for gas sensing Autor Hotový I. Spoluautori Haščík Štefan 1956 SAVELEK - Elektrotechnický ústav SAV Gregor M. Predanocy Martin 1984- SCOPUS RID Pleceník A. Zdroj.dok. Vacuum. Vol. 107, (2014), p. 20-22 Jazyk dok. eng - angličtina Druh dok. rozpis článkov z periodík (rbx) Ohlasy LEPCHA, A. - MACCATO, C. - METTENBORGER, A. - ANDREU, T. - MAYRHOFER, L. - WALTER, M. - OLTHOF, S. - RUOKO, T.P. - KLEIN, A. - MOSELER, M. - MEERHOLZ, K. - MORANTE, J.R. - BARRECA, D. - MATHUR, S. In JOURNAL OF PHYSICAL CHEMISTRY C. AUG 20 2015, vol. 119, no. 33, p. 18835-18842. AKIN, N. - KINACI, B. - OZEN, Y. - OZCELIK, S. In JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS. MAY 2017, vol. 28, no. 10, SI, p. 7376-7384. CHOI, J.S. - CHO, D.H. - LIM, E.T. - CHUNG, C.W. Influence of C2F6 Addition to Cl-2/Ar Gas on Nanometer-Scale Etch Characteristics of TiN Thin Films Using Inductively Coupled Plasma. In ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. 2018, vol. 7, no. 6, p. P339-P343. BAN, W. - KWON, S. - NAM, J. - KIM, B. - JANG, S. - JUNG, D. Characterization of TiOx Thin Films Fabricated by Plasma-Enhanced Chemical Vapor Deposition for Hard-Mask Applications in Semiconductor Devices. In SCIENCE OF ADVANCED MATERIALS. JUL 2018, vol. 10, no. 7, p. 923-929. GUO, Fei - LIU, Jiameng - ZHANG, Wanggang - YU, Zhuobin - LIU, Yiming - LIANG, Wei. Synthesis of Cu,N-doped TiO2 nanotube by a novel magnetron sputtering method and its photoelectric property. In VACUUM. ISSN 0042-207X, 2019, vol. 165, no., pp. 223-231. THAPALIYA, Bishnu P. - JAFTA, Charl J. - LYU, Hailong - XIA, Jiexiang - MEYER, Harry M. - PARANTHAMAN, M. Parans - SUN, Xiao-Guang - BRIDGES, Craig A. - DAI, Sheng. Fluorination of MXene by Elemental F-2 as Electrode Material for Lithium-Ion Batteries. In CHEMSUSCHEM. ISSN 1864-5631, 2019, vol. 12, no. 7, pp. 1316-1324. PARK, Y. - KIM, H. - LEE, J.Y. - KO, W. - BAE, K. - CHO, K.S. Direction control of colloidal quantum dot emission using dielectric metasurfaces. In NANOPHOTONICS. ISSN 2192-8606, MAY 2020, vol. 9, no. 5, SI, p. 1023-1030. HEGEMAN, I. - DIJKSTRA, M. - GARCIA-BLANCO, S.M. Low loss TiO2 channel waveguides. In INTEGRATED OPTICS: DEVICES, MATERIALS, AND TECHNOLOGIES XXIV. ISSN 0277-786X, 2020, vol. 11283. TARIQ, F. - REHMAN, N.U. - AKHTAR, N. - GEORGE, R.E. - KHAN, Y. - RAHMAN, S.U. Room temperature photoluminescence in plasma treated rutile TiO2 (110) single crystals. In VACUUM. ISSN 0042-207X, JAN 2020, vol. 171. ALIAS, N.N. - YAACOB, K.A. - YUSOH, S.N. - ABDULLAH, A.M. Comparison of KOH and TMAH Etching on Sinw Arrays Fabricated via AFM Lithography. In REGIONAL CONFERENCE ON MATERIALS AND ASEAN MICROSCOPY CONFERENCE 2017 (RCM & AMC 2017). ISSN 1742-6588, 2018, vol. 1082. PIECHULLA, Peter M. - FUHRMANN, Bodo - SLIVINA, Evgeniia - ROCKSTUHL, Carsten - WEHRSPOHN, Ralf B. - SPRAFKE, Alexander N. Tailored Light Scattering through Hyperuniform Disorder in Self-Organized Arrays of High-Index Nanodisks. In ADVANCED OPTICAL MATERIALS, 2021, vol. 9, no. 17, pp. ISSN 2195-1071. Dostupné na: https://doi.org/10.1002/adom.202100186. YIN, Teng - LI, Yan - WANG, Renheng - AL-HARTOMY, Omar A. - AL-GHAMDI, Ahmed - WAGEH, Swelm - LUO, Xiaoling - TANG, Xian - ZHANG, Han. Synthesis of Ti3C2Fx MXene with controllable fluorination by electrochemical etching for lithium-ion batteries applications. In CERAMICS INTERNATIONAL, 2021, vol. 47, no. 20, pp. 28642-28649. ISSN 0272-8842. Dostupné na: https://doi.org/10.1016/j.ceramint.2021.07.023. CHO, Y.N. - HUANG, J. - AHLES, C.F. - ZHANG, Z.C. - WONG, K. - NEMANI, S. - YIEH, E. - KUMMEL, A.C. Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide / titanium oxide nanolaminates. In APPLIED SURFACE SCIENCE. ISSN 0169-4332, OCT 30 2022, vol. 600. Dostupné na: https://doi.org/10.1016/j.apsusc.2022.154010. WU, X. - FAN, B. - XIN, Q. - LUO, Q. - SHAO, J.M. - GAO, G.H. - JIAO, P.Q. Plasma Figure Correction Method Based on Multiple Distributed Material Removal Functions. In MICROMACHINES. JUN 2023, vol. 14, no. 6. Dostupné na: https://doi.org/10.3390/mi14061193. Kategória ADCA - Vedecké práce v zahraničných karentovaných časopisoch impaktovaných Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2014 Registrované v WOS Registrované v SCOPUS Registrované v CCC DOI 10.1016/j.vacuum.2014.03.025 
článok
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2014 2013 1.426 Q2 0.568 Q2
Počet záznamov: 1